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Volume 5, Issue 2 (February 2019)

A Novel Approach For Process Modeling Of Gan Based Mos Device

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7.883
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Volume 12 Issue 07

July 2026

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Author(s)

Saumya Paliwal Shivani Saxena

Abstract

GaN Materials Are Increasingly Becoming Popular As A Replacement To The Si Based Devices. Due To Their Wide Band Gap They Have A Huge Potential For High Power And High Frequency Applications In The Field Of Military, Satellite, Led’s, Lasers, Medicine And


Keywords

Gallium Nitride MOS HEMT Device Wideband Gap 2DEG.

Paper ID

IJSARTV5I229387

Publication Date

February 17, 2019

Research Area

Electronics

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